Program At A Glance

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Program At A Glance

Thursday, October 30, 2025
Time Event
08:00-08:20 Opening Remarks
08:20-08:50 Keynote Speech
08:50-10:15 Session 1: FEOL CMP
10:15-10:45 Coffee Break & Exhibition
10:45-12:10 Session 2: BEOL CMP
12:10-13:00 Lunch Break & Exhibition
13:00-14:45 Session 3: Post CMP Cleaning
14:45-15:15 Coffee Break & Exhibition
15:15-17:25 Session 4: 3D ICs/TSV/Packaging Applications
17:25-18:30 Poster Session 1
18:30-19:30 Welcome Reception
Friday, October 31, 2025
Time Event
08:00-08:30 Keynote Speech
08:30-09:55 Session 5:  Equipment, Process Control and Metrology
09:55-10:00 Next Year ICPT Introduction
10:00-10:25 Coffee Break & Exhibition
10:25-11:50 Session 6: CMP Consumables 
11:50-12:10 Award Ceremony
12:10-13:00 Lunch Break & Exhibition
13:00-14:45 Session 7: Substrate Polishing such as Si, SiC, GaN and Diamond
14:45-15:15 Coffee Break & Exhibition
15:15-17:20 Session 8: CMP Fundamentals, Modeling and Simulation
17:20-18:30 Poster Session 2
18:30-21:00 Banquet
Saturday, November 1, 2025
Time Event
08:00-08:30 Keynote Speech
08:30-09:55 Session 9: BEOL CMP & Defects, reliability issues and Post CMP cleaning
09:55-10:25 Coffee Break & Exhibition
10:25-11:50 Session 10: 3D ICs/TSV/Packaging Applications
11:50-12:00 Student Paper Award
12:00-12:10 Closing Remarks
12:10-13:30 Lunch Break & Exhibition
14:00-17:00 Social Event

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